Pace Technologies, MP2-9009, Micropad 2 9" Diameter Polishing Pad with PSA (Stiffer Adhesive Backing)
Polishing is the most important step in preparing a specimen for micro-structural analysis. It is the step which is required to completely eliminate previous damage. Ideally the amount of damage produced during cutting and grinding was minimized through proper blade and abrasive grinding so that polishing can be minimized.
Micropad 2 - this is the most common high napped final polishing pad for most metals and polymers. Its high nap provides it a very soft and gentle polishing action.
Cloths for polishing vary by the height of their fiber, known as the nap and by the stiffness or resiliency of the fiber. In general, the lower nap (also non-woven) and stiffer fiber cloths are used for the rough polishing steps. These types of polishing cloths or pads are very effective in removing sectioning damage done by cutting and coarse grinding. Conversely, higher napped polishing cloths provide a more gentle abrasive interaction for the final polish.
| Unit of Measure | Pack of 10 pcs |
